CrAlW Alloy sputtering Target High Purity Thin Film Pvd Coating Custom Mere

A na-emepụta chrome Aluminom Tungsten sputtering target site na ntụ ntụ ntụ iji nweta ịdị ọcha dị elu, microstructure otu, njupụta dị elu na eletriki eletrik dị elu.

Chrome Aluminom Tungsten alloy bụ ihe zuru oke maka njikọ njikọ na ụlọ ọrụ electrodes.Ọ nwere elu dị larịị, ọnụego nkwụnye ego dị elu, ike siri ike, ike dielectric, yana enwere ike ịgwakọta ya nke ọma na ihe mkpụrụ.

Ọgaranya ihe pụrụ iche pụrụ iche na nrụpụta nke Sputtering Target ma nwee ike mepụta Chronium Aluminom Tungsten Sputtering Materials dị ka nkọwa ndị ahịa si dị.Ngwaahịa anyị na-egosipụta ịdị ọcha dị elu, usoro ihe jikọrọ ọnụ, njupụta dị elu na-enweghị nkewa, pores ma ọ bụ mgbawa.Maka ozi ndị ọzọ, biko kpọtụrụ anyị.