CrSi Alloy sputtering Target High Purity Thin Film Pvd Coating Custom Mere

Mepụta Chronium Silicon Sputtering Targets nwere usoro ndị a:
1.Vacuum agbaze nke Silicon na Chronium nweta nzọụkwụ alloys.
2.Ngwakọta ntụ ntụ, kpokọtara na ịchụpụ.
3.Hot isostatic ịpị ọgwụgwọ iji nweta ngwaahịa gwụchara.
4.Machining nke siri ike chromium-silicon alloy sputtering lekwasịrị anya ihe iji nweta chromium-silicon alloy sputtering lekwasịrị anya ihe onwunwe.

A na-ejikarị CrSi dị ka ihe nkiri ihe nkiri na-eguzogide elu, ọ na-egosipụta nguzogide dị elu, nkwụsi ike na ọnụ ọgụgụ dị ala nke nguzogide.Chronium na Silicon nwere ike imepụta ọtụtụ usoro silicide dị ka Cr3Si, Cr5Si3, CrSi, CrSi2.Usoro mmepụta, ihe mejupụtara na usoro ọgwụgwọ okpomọkụ nke ihe nkiri CrSi na-emetụta ọrụ ya nke ukwuu.

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike mepụta Chronium Silicon sputtering Materials dị ka nkọwa ndị ahịa si dị.Maka ozi ndị ọzọ, biko kpọtụrụ anyị.