FeSi sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi omenala emere

Alloy Silicon Iron na-enwekarị ọdịnaya silicon nke 0.5-4%.Ọ nwere mfu hysteresis dị ala karịa Iron dị ọcha yana ihe mgbochi dị elu, enwere ike itinye ya na mpaghara magnetik.Iji belata mfu ugbu a, Iron Silicon alloy na-ekpo ọkụ na-ekpo ọkụ n'ime mpempe akwụkwọ 0.35-0.5mm (silicon lamination).A na-eji silicon lamination nke ukwuu na ụlọ ọrụ ọkụ eletrik, yabụ a na-akpọkwa ya igwe eletrik.

Ferrosilicon alloy na-enye akụrụngwa magnetik mara mma yana ndọta saturation dị ala.Ọ nwere oke ọka na-enweghị oke, ikike ndọta dị elu na mgbochi, ike mmanye dị ala na ọnwụ isi.Silicon nwere ike ịkwalite graphitization nke Carbon na ígwè ma gbochie ihe omume ịka nká nke ọma.Ferrosilicon alloy nwere nkwụsi ike dị elu yana enwere ike itinye ya na gburugburu ebe obibi.

Ngwa ndị pụrụ iche bara ọgaranya bụ ọkachamara na nrụpụta nke Sputtering Target ma nwee ike imepụta ihe na-agbapụta Iron Silicon dịka nkọwa ndị ahịa si dị.Maka ozi ndị ọzọ, biko kpọtụrụ anyị.