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AlTi alloy Sputtering Target High ịdị ọcha

Aluminium Titanium

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

AlTi

Ihe mejupụtara

Aluminium Titanium

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum, PM

Nha dị

L≤2000mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Ihe achọrọ nke ebumnuche ebumnuche maka mkpuchi sputter dị elu karịa nke ụlọ ọrụ ihe ọdịnala.Microstructure otu nke ebumnuche na-emetụta arụmọrụ sputtering ozugbo.Anyị nwere usoro njikwa mma zuru oke ma anyị na-ahọrọ akụrụngwa dị ọcha ma gwakọta ha nke ọma iji hụ na ịdị n'otu.A na-emepụta ebumnuche aluminom Titanium alloy sputtering site na iji usoro ịpị ọkụ ọkụ.

Ebumnuche anyị nke aluminom Titanium sputtering nwere ike inye mkpuchi nitride na-eguzogide oxidation pụtara ìhè, Titanium aluminum nitride (TiAlN).TiAlN bụ isi ihe dị ugbu a dị ka ihe nkiri maka ịkpụ ngwaọrụ, akụkụ slide na mkpuchi tribo.Ọ nwere nnukwu isi ike, ike siri ike, ịrụ ọrụ na-eguzogide ọgwụ na okpomọkụ oxidation.

Ebumnuche AlTi anyị na-ahụkarị na akụrụngwa ha

Ti-75Al na%

Ti-70Al na%

Ti-67Al na%

Ti-60Al na%

Ti-50Al na%

Ti-30Al na%

Ti-20Al na%

Ti-14Al na%

Ịdị ọcha (%)

99.7

99.7

99.7

99.7

99.8/99.9

99.9

99.9

99.9

Njupụta(g/cm3)

3.1

3.2

3.3

3.4

3.63/3.85

3.97

4.25

4.3

Gmmiri ozuzo Nha(µm)

100

100

100

100

100/-

-

-

-

Usoro

HIP

HIP

HIP

HIP

HIP/VAR

VAR

VAR

VAR

Ọgaranya ihe pụrụ iche pụrụ iche na nrụpụta nke Sputtering Target ma nwee ike mepụta Aluminium Titanium Sputtering Materials dị ka nkọwa ndị ahịa si dị.Anyị nwere ike ịnye ụdị ụdị geometric dị iche iche: tubes, arc cathodes, planar ma ọ bụ nke a na-eme omenala, yana oke nke Aluminom.Ngwaahịa anyị nwere ihe eji arụ ọrụ dị mma, microstructure dị n'otu, elu a na-egbu maramara na-enweghị nkewa, pores ma ọ bụ mgbape.Maka ozi ndị ọzọ, biko kpọtụrụ anyị.


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