CoCrTa Alloy sputtering Target High Purity Thin Film Pvd Coating Custom Mere

A na-arụpụta ebumnuche ịgbasa Cobalt Chromium Tantalum site na usoro nkedo na ịgbaze oghere.wee kpụzie ya ka ọ bụrụ ọdịdị ebumnuche achọrọ.Ọ nwere nnukwu ịdị ọcha na microstructure homogenous.Co-Cr-Ta na-abụ ihe dị mkpa maka ndekọ magnetik maka ihe ndọta ya: mmanye dị elu, obere mkpọtụ ihe na ọmarịcha squareness.

Ngwa ahịa pụrụ iche bara ọgaranya bụ ọkachamara n'ichepụta Sputtering Target ma nwee ike ịmepụta Cobalt Chromium Tantalum Sputtering Materials dị ka nkọwa ndị ahịa si dị.Maka ozi ndị ọzọ, biko kpọtụrụ anyị.