Uru na ọghọm dị na teknụzụ mkpuchi sputtering

N'oge na-adịbeghị anya, ọtụtụ ndị ọrụ ajụla banyere uru na ọghọm dị na teknụzụ mkpuchi sputtering, Dị ka ihe ndị ahịa anyị chọrọ si dị, ugbu a ndị ọkachamara sitere na Ngalaba Teknụzụ RSM ga-eso anyị kerịta, na-atụ anya idozi nsogbu.O nwere ike ịbụ isi ihe ndị a:

　　1. magnetron sputtering enweghị nha nha

Na-eche na ndọta ikuku na-agafe n'ime na mpụta oghere magnetik nke magnetron sputtering cathode adịghị nhata, ọ bụ magnetron sputtering cathode na-enweghị isi.Ebe ndọta nke magnetron sputtering cathode nkịtị na-agbado n'akụkụ ebe a na-achọsi ike, ebe oghere ndọta nke magnetron sputtering cathode na-enweghị isi na-apụta na ebumnuche ya.Igwe ndọta nke magnetron cathode nkịtị na-egbochi plasma dị nso n'elu ebumnuche, ebe plasma dị nso na mkpụrụ ahụ adịghị ike nke ukwuu, ion na electrons siri ike agaghị agbaba mkpụrụ ahụ.Ebe magnetron cathode magnetik na-enweghị nha nha nwere ike ịgbatị plasma n'ebe dị anya site n'elu ebe a na-achọsi ike ma mikpuo mkpụrụ.

　　2. Mgbasa ozi ugboro redio (RF).

Ụkpụrụ nke itinye ihe nkiri mkpuchi mkpuchi: a na-etinye ikike na-adịghị mma na onye na-eduzi na-etinye n'azụ nke mkpuchi mkpuchi.N'ime plasma na-egbuke egbuke, mgbe efere ndu ion ziri ezi na-agba ọsọ ọsọ, ọ na-atụba ihe mgbochi dị n'ihu ya ka ọ gbasaa.Nke a sputtering nwere ike ịdịru naanị 10-7 sekọnd.Mgbe nke ahụ gasịrị, ikike dị mma nke a na-emepụta site na ụgwọ dị mma na-agbakọba na ihe mkpuchi mkpuchi na-eme ka ikike ọjọọ dị na efere onye na-eduzi, ya mere a na-akwụsị bọmbụ nke ions dị elu na-eme ka ọ dị elu.N'oge a, ọ bụrụ na polarity nke ọkọnọ ike na-atụgharị, electrons ga-atụ bọmbụ mkpuchi mkpuchi ma wepụ ụgwọ dị mma na efere mkpuchi n'ime 10-9 sekọnd, na-eme ka ọ ghara ịdị efu.N'oge a, ịtụgharị polarity nke ọkụ eletrik nwere ike ịmepụta sputtering maka 10-7 sekọnd.

Uru nke sputtering RF: ma ebumnuche ọla na ebumnuche dielectric nwere ike ịgbasa.

　　3, DC magnetron sputtering

Ngwa mkpuchi magnetron na-abawanye oghere magnet na DC sputtering cathode lekwasịrị anya, na-eji ike Lorentz nke magnetik iji kechie na ịgbatị trajectory nke electrons na mpaghara eletriki, na-abawanye ohere nke nkukota n'etiti electrons na gas atom, na-abawanye ionization ọnụego nke gas atọm, na-abawanye ọnụ ọgụgụ nke elu-ike ion bombarding ezubere iche ma na-ebelata ọnụ ọgụgụ nke elu-ike electrons bombarding plated mkpụrụ.

Uru nke planar magnetron sputtering:

1. The lekwasịrị ike njupụta nwere ike iru 12w / cm2;

2. Voltage e lekwasịrị anya nwere ike iru 600V;

3. Nrụgide gas nwere ike iru 0.5pa.

Ọdịmma nke planar magnetron sputtering: ebumnuche na-etolite ọwa sputtering na mpaghara runway, etching nke dum ebumnuche n'elu adịghị adabara, na itinye n'ọrụ nke ebumnuche bụ naanị 20% - 30%.

　　4, Intermediate ugboro AC magnetron sputtering

Ọ na-ezo aka na n'ime igwe ikuku magnetron AC na-ajụkarị, a na-ahazi ebumnuche abụọ nwere otu nha na ọdịdị n'akụkụ n'akụkụ, nke a na-akpọkarị ejima.A kwụsịtụrụ nrụnye ha.Ọtụtụ mgbe, a na-akwado ebumnuche abụọ n'otu oge.N'ime usoro nke AC magnetron reactive sputtering, ebumnuche abụọ ahụ na-eme ka anode na cathode n'aka, ha na-eme ka anode cathode ibe ha n'otu ọkara okirikiri.Mgbe ebumnobi dị na ike ọkara okirikiri na-adịghị mma, a na-atụba elu ebumnobi ma na-efesa ya site na ion dị mma;N'ime okirikiri nke ọkara dị mma, electrons nke plasma na-agbago n'elu ebumnuche iji mee ka ụgwọ dị mma agbakọbara n'elu mkpuchi mkpuchi nke elu ebumnuche, nke ọ bụghị naanị na-egbochi mgbanye nke elu ebumnuche, kamakwa na-ewepụ ihe omume nke " anode efu”.

Uru dị n'etiti ugboro abụọ ebumnuche reactive sputtering bụ:

(1) Ọnụ ego nkwụnye ego dị elu.Maka ebumnuche silicon, ọnụego nkwụnye ego nke ịgbasa sputter nke na-ajụkarị ugboro iri bụ okpukpu 10 karịa nke DC reactive sputtering;

(2) Enwere ike ime ka usoro mgbasa ozi guzosie ike na ebe arụ ọrụ setịpụrụ;

(3) Ihe omume nke "mgbanye" na-ewepụ.Ngwongwo njupụta nke ihe nkiri mkpuchi mkpuchi a kwadebere bụ ọtụtụ iwu nke na-erughị nke usoro ịgbasa sputter nke DC;

(4) Ọnọdụ okpomọkụ dị elu dị elu bara uru iji meziwanye àgwà na adhesion nke ihe nkiri ahụ;

(5) Ọ bụrụ na ọkọnọ ike dị mfe iji dakọọ ebumnuche karịa ọkụ ọkụ RF.

　　5. Reactive magnetron sputtering

N'ime usoro mgbasa ozi, a na-enye gas mmeghachi omume ahụ ka ọ na-emeghachi omume na ihe ndị ahụ na-agbapụta iji mepụta ihe nkiri mejupụtara.Ọ nwere ike na-enye gas reactive iji meghachi omume na sputtering compound lekwasịrị n'otu oge, na ọ nwekwara ike na-enye reactive gas meghachi omume na sputtering metal ma ọ bụ alloy lekwasịrị n'otu oge na-akwadebe ngwakọta film na nyere kemịkal ratio.

Uru nke ihe nkiri ihe nkiri magnetron na-emeghachi omume:

(1) Ihe ndị e lekwasịrị anya na gas mmeghachi omume na-eji bụ oxygen, nitrogen, hydrocarbons, wdg, bụ ndị na-adịkarị mfe ịnweta ngwaahịa dị elu, nke na-eme ka nkwadebe nke ihe nkiri ihe nkiri dị elu dị ọcha;

(2) Site n'ịgbanwe usoro usoro, enwere ike ịkwadebe ihe nkiri kemịkalụ ma ọ bụ ihe na-abụghị nke kemịkal, nke mere na e nwere ike gbanwee àgwà nke ihe nkiri ahụ;

(3) The substrate okpomọkụ adịghị elu, na e nwere ole na ole mgbochi na mkpụrụ;

(4) Ọ bụ adabara nnukwu-mpaghara edo mkpuchi na-aghọta mmepụta mmepụta.

Na usoro nke reactive magnetron sputtering, enweghị ntụkwasị obi nke ogige sputtering dị mfe ime, tumadi gụnyere:

(1) Ọ na-esiri ike ịkwadebe ebumnuche ndị mejupụtara;

(2) Ihe omume nke arc na-egbu egbu (mwepu arc) kpatara site na nsi e lekwasịrị anya na enweghị ike nke usoro ịgbasa;

(3) Ọnụ ego nkwụnye ego dị ala;

(4) Ngwongwo njupụta nke ihe nkiri ahụ dị elu.