Ọ ga-abụrịrị na ọtụtụ ndị ọrụ anụla maka ngwaahịa nke ebumnuche ịgbasa, mana ụkpụrụ nke ịgbasa ebumnobi kwesịrị ịbụ nke a na-amaghị ama.Ugbu a, onye nchịkọta akụkọIhe Ọgaranya Ọgaranya (RSM) na-ekerịta ụkpụrụ ịwụsa magnetron nke ebumnuche ịgbasa.
A na-agbakwunye oghere magnetik orthogonal na mpaghara eletrik n'etiti electrode lekwasịrị anya sputtered (cathode) na anode, gas inert achọrọ (n'ozuzu Ar gas) na-ejupụta n'ime ụlọ ikuku dị elu, magnet na-adịgide adịgide na-etolite 250 ~ 350 Gauss magnetik. elu nke data ebumnuche, na oghere electromagnetic orthogonal na-eji ọkụ eletrik dị elu.
N'okpuru mmetụta nke ọkụ eletrik, Ar gas na-ionized n'ime nti ion na electrons.A na-agbakwunye ụfọdụ voltaji dị elu na-adịghị mma na ebumnuche.Mmetụta nke oghere magnetik na electrons na-esi na ogwe aka lekwasịrị anya na ohere nke ionization nke gas na-arụ ọrụ na-abawanye, na-eme ka plasma dị elu dị nso na cathode.N'okpuru mmetụta nke Lorentz ike, Ar ion na-eme ngwa ngwa gaa n'elu ebe a na-eche ihu ma na-atụba ebe a na-achọsi ike na oke ọsọ ọsọ, Atọm ndị a na-agbapụta na ebumnuche na-agbaso ụkpụrụ ntụgharị ọkụ ọkụ wee fepụ n'elu ebu n'obi gaa na mkpụrụ nwere ike dị elu. itinye ihe nkiri.
A na-ekekarị sputtering Magnetron ụzọ abụọ: sputtering Tributary na RF sputtering.Ụkpụrụ nke akụrụngwa sputtering tributary dị mfe, na ọnụego ya dịkwa ngwa ngwa mgbe ị na-agbapụta ígwè.A na-eji sputtering RF eme ihe n'ọtụtụ ebe.Na mgbakwunye na sputtering ihe conductive, ọ nwekwara ike ịgbasa ihe ndị na-adịghị eduzi.N'otu oge ahụ, ọ na-eduzi sputtering reactive iji kwadebe ihe nke oxides, nitrides, carbides na ndị ọzọ ogige.Ọ bụrụ na abawanye ugboro RF, ọ ga-aghọ ngwa ngwa sputtering plasma sputtering.Ugbu a, eletrọn cyclotron resonance (ECR) ngwa ngwa plasma sputtering na-ejikarị.
Oge nzipu: Mee-31-2022