Site na mmụba nke ahịa ahịa, a na-emelite ọtụtụ ụdị ebumnuche sputtering mgbe niile.Ụfọdụ maara nke ọma ma ụfọdụ amachaghị ndị ahịa.Ugbu a, anyị ga-achọ ịkọrọ gị ụdị ebumnuche magnetron sputtering.
Ihe mgbaru ọsọ sputtering nwere ụdị ndị a: ebumnuche mkpuchi mkpuchi igwe, ihe mkpuchi mkpuchi alloy sputtering, ebumnuche mkpuchi seramiiki, ebumnuche seramiiki nke borode, ebumnuche sputtering seramiiki, ebumnuche fluoride seramiiki sputtering, nitride seramiiki sputtering, nitride seramiiki sputtering, oxide seramiiki lekwasịrị anya, selenide seramiiki lekwasịrị anya. , Silicide ceramic sputtering target, sulfide ceramic sputtering target, telluride ceramic sputtering target, ihe ndị ọzọ seramiiki lekwasịrị anya, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs ).
A na-ekekarị sputtering Magnetron ụzọ abụọ: DC sputtering na RF sputtering.Ụkpụrụ nke akụrụngwa sputter DC dị mfe, na ọnụego ya dịkwa ngwa ngwa mgbe ị na-agbapụta ígwè.A na-eji sputtering RF eme ihe n'ọtụtụ ebe.Na mgbakwunye na sputtering conductive data, ọ nwekwara ike ịgbasa data na-adịghị eduzi.N'otu oge ahụ, ebumnobi na-agbapụta na-arụkwa ọrụ ịgbasa iji kwadebe data ngwakọta dị ka oxides, nitrides na carbides.Ọ bụrụ na ugboro RF na-abawanye, ọ ga-aghọ ngwa ngwa plasma sputtering.Ka ọ dị ugbu a, a na-ejikarị ikuku plasma na-agbapụta eletrọn cyclotron resonance (ECR).
Oge nzipu: Mee-18-2022