Ugbu a ọtụtụ ndị ọrụ na-aghọta ụdị nke lekwasịrị anya nangwa ya, mana nkewa ya nwere ike ọ gaghị edo anya.Ugbu a, ka anyịOnye injinia RSM ịkọrọ gịụfọdụ induction nke magnetron sputtering lekwasịrị.
Ihe mgbaru ọsọ sputtering: ihe mkpuchi mkpuchi metal, ihe mkpuchi mkpuchi alloy, ebumnuche mkpuchi mkpuchi seramiiki, ebumnuche seramiiki borode, ebumnuche sputtering seramiiki, ebumnuche fluoride seramiiki sputtering, ebumnuche nitride seramiiki sputtering, oxide ceramic target, selenide ceramic sputtering target, selenide ceramic sputtering target. lekwasịrị anya, sulfide ceramic sputtering target, telluride ceramic sputtering target, ebumnuche seramiiki ndị ọzọ, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), arsenide target (pbas), ebumnuche indium arsenide (InAs).
A na-ekekarị sputtering Magnetron ụzọ abụọ: DC sputtering na RF sputtering.Ụkpụrụ nke akụrụngwa sputter DC dị mfe, na ọnụego ya dịkwa ngwa ngwa mgbe ị na-agbapụta ígwè.A na-eji sputtering RF eme ihe n'ọtụtụ ebe.Na mgbakwunye na sputtering conductive data, ọ nwekwara ike ịgbasa data na-adịghị eduzi.E nwekwara ike iji ihe ebumpụta ụwa mee ihe maka ịgbasa nhịahụ iji kwado data ngwakọta dị ka oxides, nitrides na carbides.Ọ bụrụ na ugboro RF na-abawanye, ọ ga-aghọ ngwa ngwa plasma sputtering.Ka ọ dị ugbu a, a na-ejikarị ikuku plasma na-agbapụta eletrọn cyclotron resonance (ECR).
Oge nzipu: Mee-26-2022