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Titanium Aluminom Silicon

TiAlSi sputtering Target High ịdị ọcha Ihe nkiri Pvd mkpuchi omenala emere onyonyo

Nkọwa dị mkpirikpi:

Otu	Alloy Sputtering Target
Usoro ọgwụ	TiAlSi
Ihe mejupụtara	Titanium Aluminom Silicon
Ịdị ọcha	99.5%, 99.9%, 99.95%
Ụdị	Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi
Usoro mmepụta	PM
Nha dị	L≤2000mm, W≤200mm

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Titanium Aluminom Silicon sputtering Target nkọwa

Titanium Aluminom Silicon sputtering target bụ nke ejiri ike igwe mebere.
Titanium Aluminom Silicon alloy nke a na-ejikarị eme ihe n'ichepụta injin ụgbọ ala.Ọ nwere mma elu-okpomọkụ dabara na eyi iguzogide.Ngwa nke Ti-Al-Si alloy nwere ike gbatịa ndụ akụrụngwa akụrụngwa maka ihe dịka 35%.Banyere ngwa ya n'ime ọgba tum tum na wiil ụgbọ ala, ọ na-egosipụta nkedo nke ọma, nrụpụta ike, ike ọgwụgwụ na mmetụta siri ike karịa A356 Aluminom.

Enwere ike nweta alloy aluminom siri ike ngwa ngwa site na usoro nkwụsi ike ngwa ngwa a na-akpọ "agbaze agbaze", nke na-emepụta ihe ndị dị elu ma e jiri ya tụnyere nke aluminom na-emekarị, yana obere microstructure dị mma na mgbanwe ndị ọzọ na alloying.Ọ bụ ihe nwere ike na ụlọ ọrụ ụgbọ elu iji dochie alloy base Titanium eji na 150-300 ℃.

N'oge usoro ntinye nke ebumnuche TiAlSi, TiAlSi/TiAlSiN nwere ike ịmepụta n'otu n'otu dị ka akwa akwa kristal dị elu nwere ọtụtụ ihe owuwu cubic.Ihe mkpuchi ọtụtụ ihe ndị a emeela ihe ndị a maka mkpuchi siri ike iji mee ka oge ndụ nke ngwá ọrụ eji eme ihe maka gburugburu ebe obibi siri ike.

Titanium Aluminom Silicon Sputtering Target Packaging

Ebumnuche Titanium Aluminom Silicon sputter ebumnuche bụ akara nke ọma ma kpọọ ya n'èzí iji hụ na njirimara na njikwa mma dị mma.A na-akpachapụ anya nke ukwuu iji zere mmebi ọ bụla nwere ike ịkpata n'oge nchekwa ma ọ bụ njem.

Nweta kọntaktị

Ebumnuche RSM Titanium Aluminom Silicon sputtering bụ nke ịdị ọcha dị oke elu yana otu.Ha dị n'ụdị dị iche iche, ịdị ọcha, nha, na ọnụ ahịa.Anyị ipuiche na-amị elu-ọcha mkpa film mkpuchi ihe na magburu onwe arụmọrụ yana ndị kasị elu kwere omume njupụta na kacha nta kwere omume nkezi ọka nha maka ojiji na ebu mkpuchi, ịchọ mma, ụgbọala akụkụ, ala-E iko, ọkara-eduzi integrated circuit, obere ihe nkiri. eguzogide, graphic ngosi, aerospace, magnetik ndekọ, ihuenyo mmetụ, obere ihe nkiri anyanwụ batrị na ndị ọzọ anụ ahụ vepo deposition (PVD) ngwa.Biko zitere anyị ajụjụ maka ọnụahịa ugbu a maka ebumnuche ịgbasa na ihe nkwụnye ego ndị ọzọ edepụtaghị.

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Osote: TiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Mere