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FeTa Sputtering Target High Purity Thin Film Pvd Coating Custom Mere

Iron Tantalum

Nkọwa dị mkpirikpi:

Otu

Alloy Sputtering Target

Usoro ọgwụ

FeTa

Ihe mejupụtara

Iron Tantalum

Ịdị ọcha

99.9%, 99.95%, 99.99%

Ụdị

Efere , Kọlụm Ezubere , arc cathodes , emebere ahaziri ahazi

Usoro mmepụta

Ịgbaze Vacuum

Nha dị

L≤200mm, W≤200mm


Nkọwa ngwaahịa

Mkpado ngwaahịa

Nkọwapụta Target Iron Tantalum Sputtering

Iron Tantalum alloy bụ ihe dabara adaba maka isi mmalite evaporation, tubes elektrọn, ngwaọrụ prosthetic, na nrụzi.Anyị na-eji usoro nkedo dị elu na nke siri ike ngwa ngwa iji nweta Fe-Ta alloy nwere ịdị ọcha dị elu na ihe owuwu homogenous.Ebumnuche anyị na-emepụta nwere ihe eji arụ ọrụ nke ọma ma nwee ike imepụta akwa elu a nụchara anụcha.

Nkwakọ ngwaahịa nke Iron Tantalum Sputtering Target

Ebumnuche Iron Tantalum sputter anyị bụ akara nke ọma ma kpọọ ya na mpụga iji hụ na njirimara na njikwa mma dị mma.A na-akpachapụ anya nke ukwuu iji zere mmebi ọ bụla nwere ike ịkpata n'oge nchekwa ma ọ bụ njem.

Nweta kọntaktị

Ebumnuche RSM Iron Tantalum sputtering bụ nke ịdị ọcha dị oke elu yana otu.Ha dị n'ụdị dị iche iche, ịdị ọcha, nha, na ọnụ ahịa.

Anyị nwere ike ịnye ụdị geometric dị iche iche: tubes, arc cathodes, planar ma ọ bụ nke emebere.Ngwaahịa anyị nwere ezigbo ihe eji arụ ọrụ, microstructure na-arụkọ ọrụ ọnụ, elu a na-egbu maramara na-enweghị nkewa, pores, ma ọ bụ mgbawa.

Anyị ipuiche na-amị elu-ọcha mkpa film mkpuchi ihe na magburu onwe arụmọrụ yana ndị kasị elu kwere omume njupụta na kacha nta kwere omume nkezi ọka nha maka ojiji na ebu mkpuchi, ịchọ mma, ụgbọala akụkụ, ala-E iko, ọkara-eduzi integrated circuit, obere ihe nkiri. eguzogide, graphic ngosi, aerospace, magnetik ndekọ, ihuenyo mmetụ, obere ihe nkiri anyanwụ batrị na ndị ọzọ anụ ahụ vepo deposition (PVD) ngwa.Biko zitere anyị ajụjụ maka ọnụahịa ugbu a maka ebumnuche ịgbasa na ihe nkwụnye ego ndị ọzọ edepụtaghị.


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