NiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Mere

Nickel Aluminom alloy sputtering target bụ nke a na-emepụta site na mgbaze oghere na ike metallurgy.Ịgwakọta Aluminom na Nickel n'ọnụ ego dị mkpa iji nye NiAl nkedo ingot.A na-egbutu ihe nkedo ka ọ bụrụ ọdịdị ebumnuche achọrọ.Ọ nwere nguzosi ike dị elu, nha ọka a nụchara anụcha na microstructure dị n'otu, na-enweghị ikuku gas ma ọ bụ pores.

N'ihi nchikota ya magburu onwe ya nke mkpuchi na ihe nkedo, mkpuchi NiAl nwere arụmọrụ dị mma n'okpuru 700 ℃.Ugbu a a na-eji NiAl sputtering lekwasịrị anya na mkpuchi mkpuchi na-eguzogide ọgwụ, gụnyere ngwaọrụ ịkpụ, ebu, ụgbọ ala na ụlọ ọrụ ihe owuwu.

Ihe ndị pụrụ iche bara ọgaranya bụ onye nrụpụta nke Sputtering Target ma nwee ike imepụta ihe na-agbapụta nickel Aluminom dịka nkọwa ndị ahịa si dị.Maka ozi ndị ọzọ, biko kpọtụrụ anyị.